Nikon has introduced the Litho Booster 1000, an alignment station developed to support the growing demands of advanced semiconductor production. The system is designed to collect high-density wafer alignment data and send correction inputs to lithography tools before exposure. This approach aims to strengthen process control and support stable production yields. The company plans to make the system available in the second half of 2026.
The Litho Booster 1000 is compatible with lithography equipment from Nikon as well as other manufacturers, offering flexibility for different facility setups. Nikon has been providing alignment station technology since 2018, and this new model extends the company’s ongoing efforts in this area.
As semiconductor devices increasingly use 3D structures across segments such as CMOS image sensors, logic chips, NAND flash, and future DRAM applications, manufacturers face growing alignment challenges. Factors like wafer deformation, multi-layer stacking, and wafer-to-wafer bonding contribute to tighter overlay requirements. These conditions call for more frequent and precise measurements during production.
The Litho Booster 1000 incorporates expanded multi-point and absolute measurement capabilities intended to support device accuracy while maintaining throughput. Part of its development was supported by research funded through a project commissioned by Japan’s New Energy and Industrial Technology Development Organization (NEDO).
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